boron doping controlled

  • Boron-doping controlled peculiar transport properties of ...

    2013-1-1 · The Boron-doping in center of graphene ribbon [16,17] weakly influence electron transport property of our p–n junctions and we mainly discuss the Boron-doping at the edge of graphene nanoribbon. The result of Ref. [15] shows that the edge Boron-doped ZGNR has the largest energy gap when the interval of Boron-doping is two ZGNR periods.

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  • Atomically controlled substitutional boron-doping of ...

    2015-8-25 · Atomically controlled substitutional boron-doping of graphene nanoribbons. Shigeki Kawai 1,2, Shohei Saito 2,3, Shinichiro Osumi 3, Shigehiro Yamaguchi 3,4,5, Adam S. Foster 6,

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  • Atomically controlled substitutional boron-doping of ...

    Boron is a unique element in terms of electron deficiency and Lewis acidity. Incorporation of boron atoms into an aromatic carbon framework offers a wide variety of functionality. However, the intrinsic instability of organoboron compounds against moisture and oxygen has delayed the development. Her

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  • Controlled boron doping of silicon - American Telephone ...

    Controlled boron doping of silicon . United States Patent 4676847 . Abstract: A technique is described for doping a silicon body with boron. The surface to be doped is typically a trench sidewall, to be used as a storage capacitor or for isolation. By providing a silicon dioxide diffusion control layer, and a polysilicon source layer that ...

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  • Controlled boron doping of silicon - AT&T Bell Laboratories

    Controlled boron doping of silicon . United States Patent 4604150 . Abstract: A technique is described for doping a silicon body with boron. The surface to be doped is typically a trench sidewall, to be used as a storage capacitor or for isolation. By providing a silicon dioxide diffusion control layer, and a polysilicon source layer that ...

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  • Atomically controlled substitutional boron-doping of ...

    2015-8-25 · Atomically controlled substitutional boron-doping of graphene nanoribbons Shigeki Kawai , a, 1, 2 Shohei Saito , 2, 3 Shinichiro Osumi , 3 Shigehiro Yamaguchi , 3, 4, 5 Adam S. Foster , 6 Peter Spijker , 6 and Ernst Meyer 1

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  • (PDF) Atomically controlled substitutional boron-doping of ...

    A common ingredient in many new GNR concepts is the controlled formation of low-energy modes and localized states. ... coming from the boundary plasma of

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  • Strain-controlled boron and nitrogen doping of

    2016-10-1 · Strain-controlled boron and nitrogen doping of amorphous carbon layers for hard mask applications. ... The key finding of our work is the experimental observation that the dry etch resistance of the ACLs is enhanced by boron doping and negatively affected by nitrogen doping. Recommended articles Citing articles (0)

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  • Atomically controlled substitutional boron-doping of ...

    2016-10-6 · Atomically controlled substitutional boron-doping of graphene nanoribbons Shigeki Kawai1,2, Shohei Saito2,3, Shinichiro Osumi3, Shigehiro Yamaguchi3,4,5, Adam S. Foster6, Peter Spijker6 & Ernst Meyer1 Boron is a unique element in terms of electron deficiency and Lewis acidity. Incorporation of

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  • Controlled nanoscale doping of semiconductors via ...

    2010-9-20 · Figure 3 Boron monolayer doping (p-doping) of Si(100). a, SIMS profile for 5s annealing at 950 and 1,000 C. b, Sheet resistance versus time at different RTA temperatures. c, Sheet resistance versus time for different boron and blank molecular precursor mixing ratios, showing controlled modulation of the B dose (RTA temperature 1,000 C). Inset ...

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  • [PDF] Atomically controlled substitutional boron-doping of ...

    2015-8-25 · DOI: 10.1038/ncomms9098 Corpus ID: 3462795; Atomically controlled substitutional boron-doping of graphene nanoribbons @article{Kawai2015AtomicallyCS, title={Atomically controlled substitutional boron-doping of graphene nanoribbons}, author={Shigeki Kawai and Shohei Saito and Shinichiro Osumi and Shigehiro Yamaguchi and Adam Stuart Foster and

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  • Boron-doping controlled peculiar transport properties of ...

    Request PDF | Boron-doping controlled peculiar transport properties of graphene nanoribbon p–n junctions | We construct two kinds of p–n junctions based on graphene nanoribbons with different ...

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  • (PDF) Atomically controlled substitutional boron-doping of ...

    A common ingredient in many new GNR concepts is the controlled formation of low-energy modes and localized states. ... coming from the boundary plasma of tokamaks. boron doping reinforces strongly ...

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  • Controlled in situ boron doping of short silicon

    2008-10-10 · Controlled in situ boron doping of short silicon nanowires grown by molecular beam epitaxy Pratyush Das Kanungo,a Nikolai Zakharov, Jan Bauer, Otwin Breitenstein, Peter Werner, and Ulrich Goesele Max Planck Institute of Microstructure Physics, Weinberg 2,

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  • Doping Level of Boron-Doped Diamond Electrodes

    2015-8-21 · The impact of different doping levels of boron-doped diamond on the surface functionalization was investigated by means of electrochemical reduction of aryldiazonium salts. The grafting efficiency of 4-nitrophenyl groups increased with the boron levels (B/C ratio from 0 to 20 000 ppm). Controlled grafting of nitrophenyldiazonium was used to adjust the amount of

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  • Atomically controlled substitutional boron-doping of ...

    2016-10-6 · Atomically controlled substitutional boron-doping of graphene nanoribbons Shigeki Kawai1,2, Shohei Saito2,3, Shinichiro Osumi3, Shigehiro Yamaguchi3,4,5, Adam S. Foster6, Peter Spijker6 & Ernst Meyer1 Boron is a unique element in terms of electron deficiency and Lewis acidity. Incorporation of

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  • Controlled Doping Methods for Radial p/n Junctions in ...

    2014-11-29 · Junctions made with SSD-boron doping and CVD-phosphorus doping could be accurately predicted with a model based on Fick's diffusion law. 3D-microstructured silicon pillar arrays show an increased efficiency for sunlight capturing. ... 23 Thorough investigations of whether common doping techniques lead to a controlled junction depth in doped ...

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  • P-N Junction Diode Using Plasma Boron-Doped Black ...

    This study used a spatially controlled boron-doping technique that enables a p-n junction diode to be realized within a single 2D black phosphorus (BP) nanosheet for high-performance photovoltaic application. The reliability of the BP surface and state-of-the-art 2D p-n heterostructure's gated junct

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  • Interstitial boron-doped mesoporous semiconductor

    2021-1-19 · The boron doping also profoundly altered the wetting properties as well. Whereas undoped mesoporous SnO 2 , ZnO, and In 2 O 3 (MT, MZ, and MI) are hydrophobic, MTB-1, MZB-1, and MIB-1 are ...

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  • 2. Semiconductor Doping Technology

    2011-2-22 · Boron is referred to as an acceptor impurity and doping with boron forms a p-type semiconductor. The dopant impurities used in controlling the conductivity type of a semiconductor usually have very small ionization

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  • [PDF] Atomically controlled substitutional boron-doping of ...

    2015-8-25 · DOI: 10.1038/ncomms9098 Corpus ID: 3462795; Atomically controlled substitutional boron-doping of graphene nanoribbons @article{Kawai2015AtomicallyCS, title={Atomically controlled substitutional boron-doping of graphene nanoribbons}, author={Shigeki Kawai and Shohei Saito and Shinichiro Osumi and Shigehiro Yamaguchi and Adam Stuart Foster and

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  • Controlled in situ boron doping of diamond thin films ...

    2006-12-20 · Controlled boron doping of diamond film using nontoxic reagents is a challenge in itself. During the present study, attempts have been made to dope diamond films in situ with boron from a solution of boric acid (H 3 B O 3) in methanol (C H 3 O H) using a specially designed bubbler that ensured continuous and controlled flow of vapors of boron precursors during

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  • Boron-doping controlled peculiar transport properties of ...

    We construct two kinds of p-n junctions based on graphene nanoribbons with different doping concentration. The left part of junction is Boron-doped at the edge of zigzag-edge graphene nanoribbon, and the right part is Boron-doped at the center. The transport properties, calculated by nonequilibrium Green's function method combined with the density functional theory under

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  • Boron doping and structure control of carbon materials for ...

    2020-1-21 · In the present work, we demonstrate a strategy of combining boron doping and porosity engineering for a highly modulated carbon component and pore structure, in which two contrasting drying methods (air-drying, freeze-drying) and their effects on supercapacitor performance are investigated in detail. Under freeze-drying and air-drying conditions, carbon

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  • Dopant activation and photoresponses of boron-doped ...

    2019-12-18 · Monolayer doping (MLD) is an emerging technique for controlled doping at nanoscale. 1,2 1. K. ... The correlation of boron doping concentration and photoresponses indicates that the defects are boron-correlated ones, mostly B

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  • Controlled nanoscale doping of semiconductors via ...

    2010-9-20 · Figure 3 Boron monolayer doping (p-doping) of Si(100). a, SIMS profile for 5s annealing at 950 and 1,000 C. b, Sheet resistance versus time at different RTA temperatures. c, Sheet resistance versus time for different boron and blank molecular precursor mixing ratios, showing controlled modulation of the B dose (RTA temperature 1,000 C). Inset ...

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  • Tailorable boron-doped carbon nanotubes as high

    Doping of specific boron species in carbon frameworks plays an important role in enhancing the electrochemical properties of carbon. Herein, we prepared a tailored boron species-doped carbon nanotube (CNT) catalyst as the counter electrode (CE) of quantum dot sensitized solar cells (QDSSCs) by hydrothermal post-treatment of pre-oxidized CNTs.

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  • Effects of boron doping on the structural and optical ...

    Effects of boron doping on the structural and optical properties of silicon nanocrystals in a silicon dioxide matrix ... The boron concentration was controlled by adjusting the power applied to the boron target. Two groups of samples were prepared for analysis. Group A consists of

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  • 2. Semiconductor Doping Technology

    2011-2-22 · Boron is referred to as an acceptor impurity and doping with boron forms a p-type semiconductor. The dopant impurities used in controlling the conductivity type of a semiconductor usually have very small ionization

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  • Controlled nanoscale doping of semiconductors via ...

    2007-11-11 · One of the major challenges towards scaling electronic devices to the nanometre-size regime is attaining controlled doping of semiconductor materials with atomic accuracy, as at such small scales ...

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